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Proceedings Paper

New advances and steam laser cleaning of opaque and transparent critical substrates: with IR-lasers to new laser cleaning mechanism
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Paper Abstract

Dry and steam laser cleaning, DLC and SLC, of nano-and micro contaminant particles from UV/vis opaque and transparent critical substrates has been studied in front-side laser illumination geometry with the help of time-resolved optical techniques using a nanosecond IR CO2-laser and different energy transfer media (ETM) fluids. In the case of SLC, microscopic details of particle-ETM-substrate interactions in pre-deposited micron-thick ETM layers have been revealed preliminarily by means of time-resolved optical microscopy. Fundamental DLC and SLC mechanisms for removal of nano- and micro-particles from opaque and transparent critical substrates have been determined. Optimal conditions for nearly complete laser cleaning have been chosen for different combinations of contaminating nano- and micro-particles and substrates.

Paper Details

Date Published: 1 March 2006
PDF: 15 pages
Proc. SPIE 6106, Photon Processing in Microelectronics and Photonics V, 610609 (1 March 2006); doi: 10.1117/12.647017
Show Author Affiliations
Shishir Shukla, Univ. of Memphis (United States)
Arkansas State Univ. (United States)
Sergey Kudryashov, Arkansas State Univ. (United States)
Kevin Lyon, Arkansas State Univ. (United States)
Susan D. Allen, Univ. of Memphis (United States)
Arkansas State Univ. (United States)


Published in SPIE Proceedings Vol. 6106:
Photon Processing in Microelectronics and Photonics V
David B. Geohegan; Tatsuo Okada; Craig B. Arnold; Frank Träger; Jan J. Dubowski; Michel Meunier; Andrew S. Holmes, Editor(s)

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