Share Email Print
cover

Proceedings Paper

Fabrication issues for a chirped subwavelength form-birefringent polarization splitter
Author(s): S. A. Kemme; J. R. Wendt; G. A. Vawter; A. A. Cruz-Cabrera; D. W. Peters; R. R Boye; C. R Alford; T. R. Carter; S. Samora
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We report here on an effort to design and fabricate a polarization splitter that utilizes form-birefringence to disperse an input beam as a function of polarization content as well as wavelength spectrum. Our approach is unique in the polarization beam splitting geometry and the potential for tailoring the polarized beams' phase fronts to correct aberrations or add focusing power. A first cut design could be realized with a chirped duty cycle grating at a single etch depth. However, this approach presents a considerable fabrication obstacle since etch depths are a strong function of feature size, or grating period. We fabricated a period of 1.0 micron form-birefringent component, with a nominal depth of 1.7 microns, in GaAs using a CAIBE system with a 2-inch ion beam source diameter. The gas flows, ion energy, and sample temperature were all optimized to yield the desired etch profile.

Paper Details

Date Published: 23 January 2006
PDF: 8 pages
Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100J (23 January 2006); doi: 10.1117/12.646796
Show Author Affiliations
S. A. Kemme, Sandia National Labs. (United States)
J. R. Wendt, Sandia National Labs. (United States)
G. A. Vawter, Sandia National Labs. (United States)
A. A. Cruz-Cabrera, Sandia National Labs. (United States)
D. W. Peters, Sandia National Labs. (United States)
R. R Boye, Sandia National Labs. (United States)
C. R Alford, L and M Technologies (United States)
T. R. Carter, L and M Technologies (United States)
S. Samora, L and M Technologies (United States)


Published in SPIE Proceedings Vol. 6110:
Micromachining Technology for Micro-Optics and Nano-Optics IV
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

© SPIE. Terms of Use
Back to Top