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Proceedings Paper

Multilayer integrated nano-optical devices
Author(s): Jian Wang; Xuegong Deng; Xiaoming Liu; Anguel Nikolov; Paul Sciortino; Feng Liu; Lei Chen
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Paper Abstract

We report optical devices based on monolithic integration of multiple nano-structured optical functional layers. Ultraviolet (UV)-nanoimprint lithography along with thin-film deposition, high aspect-ratio reactive ion etching (RIE) and trench-filling technologies were used in fabrication and integration of individual nano-structured optical functional layers. Structures with sub-50 nm linewidth were required in order to achieve good optical performance in the near-UV and visible wavelengths. The ability to integrate multiple nanostructure-based optical layers opens a path for novel integrated optical devices, as well as a new strategy for driving both miniaturization and cost.

Paper Details

Date Published: 24 February 2006
PDF: 10 pages
Proc. SPIE 6123, Integrated Optics: Devices, Materials, and Technologies X, 61230P (24 February 2006); doi: 10.1117/12.646272
Show Author Affiliations
Jian Wang, NanoOpto Corp. (United States)
Xuegong Deng, NanoOpto Corp. (United States)
Xiaoming Liu, NanoOpto Corp. (United States)
Anguel Nikolov, NanoOpto Corp. (United States)
Paul Sciortino, NanoOpto Corp. (United States)
Feng Liu, NanoOpto Corp. (United States)
Lei Chen, NanoOpto Corp. (United States)


Published in SPIE Proceedings Vol. 6123:
Integrated Optics: Devices, Materials, and Technologies X
Yakov Sidorin; Christoph A. Waechter, Editor(s)

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