Share Email Print
cover

Proceedings Paper

Optical analysis of scanning microstereolithography systems
Author(s): Suhas P. Deshmukh; Shashikant Dubey; P. S. Gandhi
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Microstereolithography (MSL) is rapidly developing technique for micro-fabrication. Vector-by-vector scanning MSL has a potential to create true 3D micro-devices as compared to mostly planar (2D-2 1/2 D) devices fabricated by conventional MEMS techniques. Previous literature shows two different scanning methods:(1) Galvanomirror scanning, (2) Photoreactor tank scanning. Galvanomirror scanning technique has higher fabrication speed but poor resolution because of defocusing of laser spot on the resin surface. Photo-reactor tank scanning has higher resolution but produces a wavy structures and limited speed of fabrication. This paper proposes and develops an offaxis lens scanning technique for MSL and carries out optical analysis to compare its performance with the existing techniques mentioned above. The comparison clearly demonstrates improved performance with the proposed offaxis lens scanning technique.

Paper Details

Date Published: 23 January 2006
PDF: 6 pages
Proc. SPIE 6109, Micromachining and Microfabrication Process Technology XI, 61090C (23 January 2006); doi: 10.1117/12.645856
Show Author Affiliations
Suhas P. Deshmukh, Indian Institute of Technology Bombay (India)
Shashikant Dubey, Indian Institute of Technology Bombay (India)
P. S. Gandhi, Indian Institute of Technology Bombay (India)


Published in SPIE Proceedings Vol. 6109:
Micromachining and Microfabrication Process Technology XI
Mary-Ann Maher; Harold D. Stewart; Jung-Chih Chiao, Editor(s)

© SPIE. Terms of Use
Back to Top