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Proceedings Paper

3D photonic devices at telecom wavelengths fabricated by a femtosecond oscillator
Author(s): V. Maselli; R. Osellame; N. Chiodo; G. Cerullo; P. Laporta; P. Ferraro; S. De Nicola; A. Finizio
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Paper Abstract

Optical waveguide writing with femtosecond laser pulses represents a good alternative to traditional fabrication methods thanks to its simplicity, flexibility and possibility to realize 3D structures. The direct use of a laser oscillator allows a simpler setup, without amplification stages, greater processing speed, up to 1 cm/s, and intrinsically symmetric waveguide cross-sections due to isotropic heat diffusion. In this work we report on the fabrication and optical characterization of waveguides at telecom wavelengths by a stretched-cavity (26 MHz repetition rate) Ti:Sapphire oscillator. The best results have been obtained on Corning 0211 and the previously unexplored Schott IOG10. Operation at 1.55-micron is demonstrated and a comparison between optical properties of the waveguides on the two glasses is made. The refractive index profiles have been measured with two different techniques: the innovative Digital Holography Microscopy (DHM), applied for the first time to optical waveguides, and near-field refractive index profilometry (RNF). The shape of the refractive index profile was found to depend strongly on the glass type. We demonstrate passive photonic devices at 1.55-micron, exploiting the unique 3D capabilities of the technique. These devices include: (i) a 1x2 splitter, obtained by writing two straight waveguides at an angle and separated by a depth displacement; (ii) a 1x4 splitter, realized by combining 1x2 splitters on different planes in the depth; (iii) a WDM coupler, with a good rejection of the 980-nm signal with respect to the 1550-nm one. Perspectives of the technique will also be addressed.

Paper Details

Date Published: 28 February 2006
PDF: 11 pages
Proc. SPIE 6108, Commercial and Biomedical Applications of Ultrafast Lasers VI, 61080W (28 February 2006); doi: 10.1117/12.644753
Show Author Affiliations
V. Maselli, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
R. Osellame, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
N. Chiodo, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
G. Cerullo, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
P. Laporta, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
P. Ferraro, Istituto Nazionale di Ottica Applicata (Italy)
Istituto di Cibernetica del CNR E. Caianiello (Italy)
S. De Nicola, Istituto Nazionale di Ottica Applicata (Italy)
Istituto di Cibernetica del CNR E. Caianiello (Italy)
A. Finizio, Istituto Nazionale di Ottica Applicata (Italy)
Istituto di Cibernetica del CNR E. Caianiello (Italy)


Published in SPIE Proceedings Vol. 6108:
Commercial and Biomedical Applications of Ultrafast Lasers VI
Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer, Editor(s)

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