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Proceedings Paper

Grey scale electron-beam lithography in functionalized SU-8 for active optical devices
Author(s): S. Balslev; T. Rasmussen; P. Shi; A. Kristensen
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Paper Abstract

Miniaturized, single mode polymer dye lasers are realized by means of grey scale electron beam lithography (EBL) in functionalized SU-8 2000 resist, doped with Rhodamine 6G laser dye. These devices offer the possibility of easy integration of single mode laser sources in polymer based lab-on-a-chip microsystems. The demonstrated laser device consists of a planar waveguide with a 1st-order distributed feedback grating (DFB) surface corrugation, which forms an optical resonator. When optically pumped at 532 nm, single mode lasing is obtained in the wavelength range 570 nm - 630 nm, determined by the grating period. Our results demonstrate the feasibility of fabricating advanced nano-structured active optical components in a rapid prototyping process.

Paper Details

Date Published: 23 January 2006
PDF: 8 pages
Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100C (23 January 2006); doi: 10.1117/12.641213
Show Author Affiliations
S. Balslev, Technical Univ. of Denmark (Denmark)
T. Rasmussen, Technical Univ. of Denmark (Denmark)
P. Shi, Technical Univ. of Denmark (Denmark)
A. Kristensen, Technical Univ. of Denmark (Denmark)

Published in SPIE Proceedings Vol. 6110:
Micromachining Technology for Micro-Optics and Nano-Optics IV
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

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