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Proceedings Paper

Nonlinear absorption of ultrashort pulses in HR dielectric mirrors
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Paper Abstract

Nonlinear absorption measurements at 800 nm and 400 nm in single wavelength high reflection (HR) dielectric mirrors were performed, according to the ISO 11551 standard by pulse, gradient and exponential absorption evaluation methods, using pulsed, diode pumped femtosecond laser system with pulse duration ~130 fs. Pulsed laser output at 1kHz repetition rate had 1 W and 0.36 W average power at 800 nm and 400 nm, respectively. The HR mirrors were made of ZrO2 and SiO2 layers. The beam was focused into the mirror, and changing the beam power by step attenuator, it was possible to evaluate nonlinear absorption at different intensities up to intensity close to damage threshold. The nonlinear absorptance for 400 nm pulses at the femtosecond pulse intensity 0.8 TW/cm2 was 0.48 % and ~20 times exceeded the nonlinear absorptance for the 800 nm pulses.

Paper Details

Date Published: 7 February 2006
PDF: 10 pages
Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 599111 (7 February 2006); doi: 10.1117/12.639032
Show Author Affiliations
Andrius Žukauskas, Vilnius Univ. (Lithuania)
Andrius Melninkaitis, Vilnius Univ. (Lithuania)
Valdas Sirutkaitis, Vilnius Univ. (Lithuania)
Kai Starke, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 5991:
Laser-Induced Damage in Optical Materials: 2005
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M.J. Soileau; Christopher J. Stolz, Editor(s)

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