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Proceedings Paper

Influence of object position on accuracy of optical measurement systems
Author(s): Antonin Miks; Jiri Novak
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Paper Abstract

The work analyses an influence of the change of object position on the accuracy of optical and optoelectronic measurement systems using both geometrical and diffraction theory. It is shown that in case of the change of position of the measured object the imaging properties of the used optical measurement instrument are changed. This position change affects the image quality. If some optical measurement system is aberration free for a specified position of the measured object, then for other object positions the optical system has aberrations. The consequence of this effect is the change of the measurement accuracy for the specific optical system. The described effect is not removable on principle and it is necessary to take account to it in high accuracy measurements.

Paper Details

Date Published: 6 December 2006
PDF: 11 pages
Proc. SPIE 5945, 14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 59450S (6 December 2006); doi: 10.1117/12.638925
Show Author Affiliations
Antonin Miks, Czech Technical Univ. (Czech Republic)
Jiri Novak, Czech Technical Univ. (Czech Republic)


Published in SPIE Proceedings Vol. 5945:
14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Anton Štrba; Dagmar Senderákova; Miroslav Hrabovský, Editor(s)

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