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Proceedings Paper

Pulsed laser cleaning of sub- and micron-size contaminant particles from optical surfaces: cleaning versus ablation and damage
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Paper Abstract

Pulsed laser cleaning of sub- and micron-sized (0.3-10 μm) monodispersed model spherical polystyrene particles and fused silica particles from fused silica and glass optical surfaces was performed by means of ns TEA CO2 laser. Efficient removal of these absorbing particles has been demonstrated in certain laser fluence range, which is below the threshold for ablative damage of the fused silica and glass substrate. Removal mechanisms of dry and steam laser cleaning of various critical optical surfaces are discussed.

Paper Details

Date Published: 7 February 2006
PDF: 10 pages
Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59910N (7 February 2006); doi: 10.1117/12.638820
Show Author Affiliations
Shishir Shukla, Univ. of Memphis (United States)
Arkansas State Univ. (United States)
Sergey Kudryashov, Arkansas State Univ. (United States)
Kevin Lyon, Arkansas State Univ. (United States)
Susan D. Allen, Univ. of Memphis (United States)
Arkansas State Univ. (United States)


Published in SPIE Proceedings Vol. 5991:
Laser-Induced Damage in Optical Materials: 2005
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M.J. Soileau; Christopher J. Stolz, Editor(s)

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