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Proceedings Paper

Opportunities and challenges of ArF immersion lithography imaging
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Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59922I; doi: 10.1117/12.638798
Show Author Affiliations
Geert Vandenberghe, IMEC (Belgium)
Kurt G. Ronse, IMEC (Belgium)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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