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Proceedings Paper

Combinatorial deposition by r.f. magnetron sputtering using subdivided powder targets as new development method for thin-film phosphors
Author(s): Toshihiro Miyata; Yuu Mochizuki; Tadatsugu Minami
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Paper Abstract

A new technique incorporating combinatorial deposition to develop new multicomponent oxide and oxynitride thin-film phosphors by r.f. magnetron sputtering is demonstrated using subdivided powder targets. By sputtering with a powder target that is subdivided into two or more parts, phosphor thin films with a chemical composition that varied across the substrate surface could be successfully prepared. In Zn2Si1-XGeXO4:Mn thin films, for example, the chemical composition (Ge content (X)) could be optimized to obtain higher electroluminescent and photoluminescent emission intensities by using only one deposition with the new technique. As a result, a high luminances of 11800 and 1536 cd/m2 for green emission was obtained in Zn2Si0.6Ge0.4O4:Mn TFEL device driven at 1 kHz and 60 Hz, respectively. In ((AlN)1-X-(CaO)X):Eu thin films, for example, the chemical composition (CaO content (X)) could be optimized to obtain higher electroluminescent and photoluminescent emission intensities by using only one deposition with the new technique. As a result, a luminance of 170 cd/m2 for red emission was obtained in an ((AlN)0.1-(CaO)0.9):Eu TFEL device driven at 1 kHz.

Paper Details

Date Published: 3 January 2006
PDF: 12 pages
Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 60371U (3 January 2006); doi: 10.1117/12.638724
Show Author Affiliations
Toshihiro Miyata, Kanazawa Institute of Technology (Japan)
Yuu Mochizuki, Kanazawa Institute of Technology (Japan)
Tadatsugu Minami, Kanazawa Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 6037:
Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
Jung-Chih Chiao; Andrew S. Dzurak; Chennupati Jagadish; David V. Thiel, Editor(s)

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