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Proceedings Paper

A new fabrication process of silicon nanotips: NERCOM
Author(s): Francis E. H. Tay; Ciprian Iliescu; Guolin Xu; Bangtao Chen; Marioara Avram
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Paper Abstract

This paper presents a new fabrication process for nanotips array using notching effect of reflected charges on mask (NERCOM). The NERCOM fabrication process is based on two phenomena: flowing of thick photoresist mask after bake and the notching effect of the reflected charges from the photoresist mask in a plasma etching process. Heating the photoresist at different temperature and time will generate different profile of the masking layer walls. During the plasma etching process, the charges (ions and radicals) are reflected by the oblique profile of the masking layer walls and generate an undercut. This phenomenon is utilized with an isotropic etching process in a Deep RIE system to produce tips. Due to the isotropy of the process, the tips are generated. The results indicate that the radii of the tips are in the range of 40 to 60 nm.

Paper Details

Date Published: 19 January 2006
PDF: 8 pages
Proc. SPIE 6036, BioMEMS and Nanotechnology II, 603608 (19 January 2006); doi: 10.1117/12.638516
Show Author Affiliations
Francis E. H. Tay, Institute of Bioengineering and Nanotechnology (Singapore)
National Univ. of Singapore (Singapore)
Ciprian Iliescu, Institute of Bioengineering and Nanotechnology (Singapore)
Guolin Xu, Institute of Bioengineering and Nanotechnology (Singapore)
Bangtao Chen, Institute of Bioengineering and Nanotechnology (Singapore)
Marioara Avram, National Institute for Research and Development in Microtechnologies (Romania)

Published in SPIE Proceedings Vol. 6036:
BioMEMS and Nanotechnology II
Dan V. Nicolau, Editor(s)

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