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Proceedings Paper

High speed reflectometer for EUV mask-blanks
Author(s): Christian Wies; Rainer Lebert; Bernhard Jagle; L. Juschkin; F. Sobel; H. Seitz; Ronny Walter; C. Laubis; F. Scholze; W. Biel; O. Steffens
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Paper Abstract

AIXUV GmbH and partners have developed a high speed Reflectometer for EUV mask-blanks which is fully compliant with the SEMI-standard P38 for EUV-mask-blank metrology. The system has been installed in June 2004 at SCHOTT Lithotec AG. It features high throughput, high lateral and spectral resolution, high reproducibility and low absolute uncertainty. Using AIXUV's EUV-LAMP and debris mitigation, low cost-of-ownership and high availability is expected. The spectral reflectance of up to 3 mask-blanks per hour can be measured with at least 20 spots each. The system is push button-controlled. Results are stored in CSV file format. For a spot size of 0.1x1 mm2, 2000 spectral channels of 1.6 pm bandwidth are recorded from 11.6 nm to 14.8 nm. The reflectance measurement is based on the comparison of the sample under test to two reference mirrors calibrated at the PTB radiometry laboratory at BESSY II. The three reflection spectra are recorded simultaneously. For each spot more than 107 photons are accumulated in about 20 s, providing statistical reproducibility below 0.2% RMS. The total uncertainty is below 0.5% absolute. Wavelength calibration better than 1 pm RMS over the whole spectral range is achieved by reference to NIST published wavelengths of about 100 xenon emission lines. It is consistent with the wavelength of the krypton 3d-5p absorption resonance at 13.5947 nm to better than 2 pm.

Paper Details

Date Published: 16 June 2005
PDF: 11 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637341
Show Author Affiliations
Christian Wies, AIXUV GmbH (Germany)
Rainer Lebert, AIXUV GmbH (Germany)
Bernhard Jagle, AIXUV GmbH (Germany)
L. Juschkin, AIXUV GmbH (Germany)
F. Sobel, SCHOTT Lithotec AG (Germany)
H. Seitz, SCHOTT Lithotec AG (Germany)
Ronny Walter, SCHOTT Lithotec AG (Germany)
C. Laubis, Physikalisch-Technische Bundesanstalt (Germany)
F. Scholze, Physikalisch-Technische Bundesanstalt (Germany)
W. Biel, IPP, Forschungszentrum Julich GmbH (Germany)
O. Steffens, S&F NC-Systemtechnik GbR (Germany)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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