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Proceedings Paper

Production challenges of making EUV mask blanks
Author(s): Holger Seitz; Frank Sobel; Markus Renno; Thomas Leutbecher; Nathalie Olschewski; Thorsten Reichardt; Ronny Walter; Hans Becker; Ute Buttgereit; Gunter Hess; Konrad Knapp; Christian Wies; Rainer Lebert
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Paper Abstract

Mask Blanks for EUV Lithography require a lot of new properties and features compared to standard Chrome-on-Glass blanks. Starting from completely new low thermal expansion substrate materials with significantly improved surface quality over multilayer coatings for EUV reflection, buffer layers, up to new absorber layers with improved dry etching and inspection properties. In addition highly sophisticated metrology is needed for further improvements and process control. New polishing and cleaning technologies, improved sputter technology and updated metrology enable us to routinely produce EUVL mask blanks meeting already many of the ITRS roadmap requirements. Our improvements on low defect EUV multilayer coatings as well as on our metrology methods will be elucidated and some aspects of this will be explained in detail. In addition a new design of EUVL absorber material with experimental results will be reported, including optical performance at inspection wavelength.

Paper Details

Date Published: 16 June 2005
PDF: 8 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637335
Show Author Affiliations
Holger Seitz, SCHOTT Lithotec AG (Germany)
Frank Sobel, SCHOTT Lithotec AG (Germany)
Markus Renno, SCHOTT Lithotec AG (Germany)
Thomas Leutbecher, SCHOTT Lithotec AG (Germany)
Nathalie Olschewski, SCHOTT Lithotec AG (Germany)
Thorsten Reichardt, SCHOTT Lithotec AG (Germany)
Ronny Walter, SCHOTT Lithotec AG (Germany)
Hans Becker, SCHOTT Lithotec AG (Germany)
Ute Buttgereit, SCHOTT Lithotec AG (Germany)
Gunter Hess, SCHOTT Lithotec AG (Germany)
Konrad Knapp, SCHOTT Lithotec AG (Germany)
Christian Wies, AIXUV GmbH (Germany)
Rainer Lebert, AIXUV GmbH (Germany)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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