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Proceedings Paper

Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system
Author(s): K. Reimer; M. Witt; D. Kahler; J. Eichholz; L. Ratzmann; W. Brunger; H.-J, Doring; E. Haugeneder; S. Eder-Kapl; R. Nowak
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Paper Abstract

Objective of this paper is the design and fabrication of the individual plates of the APS. Microsystems Technology is used for aperture chip processing with chip sizes up to 23 mm x 23 mm.

Paper Details

Date Published: 16 June 2005
PDF: 9 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637320
Show Author Affiliations
K. Reimer, Fraunhofer Institut fur Siliziumtechnologie (Germany)
M. Witt, Fraunhofer Institut fur Siliziumtechnologie (Germany)
D. Kahler, Fraunhofer Institut fur Siliziumtechnologie (Germany)
J. Eichholz, Fraunhofer Institut fur Siliziumtechnologie (Germany)
L. Ratzmann, Fraunhofer Institut fur Siliziumtechnologie (Germany)
W. Brunger, Fraunhofer Institut fur Siliziumtechnologie (Germany)
H.-J, Doring, Leica Microsystems Lithography GmbH (Germany)
E. Haugeneder, IMS Jena GmbH (Germany)
S. Eder-Kapl, IMS Nanofabrication GmbH (Austria)
R. Nowak, IMS Nanofabrication GmbH (Austria)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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