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Proceedings Paper

High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform
Author(s): Syarhei Avakaw
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Paper Abstract

The paper presents a description of one of the main elements of a new modular automatic reticle defect inspection platform-a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.

Paper Details

Date Published: 16 June 2005
PDF: 10 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637300
Show Author Affiliations
Syarhei Avakaw, Planar State Scientific and Production Concern for Precision Machine Building (Belarus)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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