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Proceedings Paper

Demonstrators: a vital step forward for projection mask-less lithography (PML2)
Author(s): Christoph Brandstaetter; Ernst Haugeneder; Hans-Joachim Doering; Thomas Elster; Joachim Heinitz; Olaf Fortagne; Stefan Eder-Kapl; Gertraud Lammer; Peter Jochl; Hans Loeschner; Klaus Reimer; Juergen Saniter; Maati Talmi; Ramona Eberhardt; Klaus Kroenert
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Paper Abstract

Electron beam based Projection Mask-Less Lithography (PML2) is one of the promising candidates for fast chip devel-opment and prototyping as well as for small and medium volume device production for the 45nm technology node and beyond. The concept of the PML2 proof-of-concept tool comprises a single electron optical column, a multi beam blank-ing device (programmable "Aperture Plate System") including high speed optical data path and a scanning 300mm wa-fer stage. More than 290.000 beams will be projected onto the wafer used for a highly redundant scanning stripe expo-sure process. The PML2 proof-of-concept tool will be built as part of the European MEDEA+ project T409 and the joint project "Ab-bildungsmethodiken fur nanoelektronische Bauelemente-ABBILD" in Germany. To show the feasibility of PML2 key modules in an early stage several demonstrators and test stands have been developed. In this paper demonstration setups and first results of the electron optics modeling, gun prototype, Aperture Plate System and the Optical Data Path are pre-sented.

Paper Details

Date Published: 16 June 2005
PDF: 8 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637298
Show Author Affiliations
Christoph Brandstaetter, IMS Jena GmbH (Germany)
Ernst Haugeneder, IMS Jena GmbH (Germany)
Hans-Joachim Doering, Leica Microsystems Lithography GmbH (Germany)
Thomas Elster, Leica Microsystems Lithography GmbH (Germany)
Joachim Heinitz, Leica Microsystems Lithography GmbH (Germany)
Olaf Fortagne, Leica Microsystems Lithography GmbH (Germany)
Stefan Eder-Kapl, IMS Nanofabrication GmbH (Austria)
Gertraud Lammer, IMS Nanofabrication GmbH (Austria)
Peter Jochl, IMS Nanofabrication GmbH (Austria)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Klaus Reimer, Fraunhofer Institute for Silicon Technology (Germany)
Juergen Saniter, Fraunhofer Heinrich Hertz Institute (Germany)
Maati Talmi, Fraunhofer Heinrich Hertz Institute (Germany)
Ramona Eberhardt, Fraunhofer Institute for Optics and Precision Engineering (Germany)
Klaus Kroenert, Equicon GmbH (Germany)

Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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