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Proceedings Paper

Flare metrology used for PSD reconstruction
Author(s): Michael Arnz
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Paper Abstract

During the last years due to low-k1 imaging , mid- and longrange flare as well as the necessity to quantify it , became more and more important for lithography optical systems. The so-called power spectral density (PSD) was proven to be an adequate means for describing rangedependent flare. At Carl Zeiss SMT AG a PSD metrology was concepted and sucessfully tested as one method for newest generation systems. We will give an outline into this aerial image based metrology and especially pay attention onto: 1. signal calibration as well as accurate focussing and lateral positioning 2. vignetting-free detection in face of large numerical apertures (near 1) 3. correlation with alternative flare metrics used in our house Both the necessity and the potential for extending the technique towards 193 nm immersion lithographic systems will be basically shown , too. The application of well-known models like the ABC and (as special case) the fractal PSD-model will be discussed for typical measurements. Limit cases and their physical meaning will be deduced for the fractal model.

Paper Details

Date Published: 16 June 2005
PDF: 10 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637297
Show Author Affiliations
Michael Arnz, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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