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Proceedings Paper

Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography
Author(s): Ming L. Yu; Allan Sagle; Benny Buller
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Paper Abstract

We have used our Quadra lithography system to evaluate the shot-noise-induced critical dimension uniformity (CDU). We found that at the isofocal dose, the shot-noise-induced CDU is directly proportional to the edge blur, and hence the rate of CD changes with dose. This emphasizes the importance of minimizing beam blur of the system. We used a phenomenological model to analyze our experimental data. The model included the counting statistics of the incident electrons and that of the electron induced chemistry. With the proper parameters, this model matches the experimental observations well. It also predicts the limit of the improvements and suggests guides for the optimization of the lithographic process.

Paper Details

Date Published: 16 June 2005
PDF: 10 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637293
Show Author Affiliations
Ming L. Yu, Etec Systems, Applied Materials, Inc. (United States)
Allan Sagle, Etec Systems, Applied Materials, Inc. (United States)
Benny Buller, Etec Systems, Applied Materials, Inc. (United States)

Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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