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Proceedings Paper

Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer
Author(s): Thomas Ostrom; Angela Beyerl; Henrik Sjoberg; Tom Newman; Peter Hogfeldt
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Paper Abstract

Phase shifting mask (PSM) development activity is increasing as 193nm optical lithography is extended beyond the 90nm technology node. The requirements on second level mask patterning of advanced PSM have for many applications exceeded the capability of i-line pattern generators, and it is natural for deep-ultraviolet (DUV) pattern generators to be employed for this task. The Sigma7300 DUV mask writer has the attributes required for advanced PSM applications: high resolution, tight CD uniformity and pattern placement, an accurate alignment system, and grid matching to first level exposures. The paper reports system performance for the parameters that constitute the error budget for second level patterning and shows that the mask writer is suitable for second level patterning of advanced PSMs. The alignment system employs the same laser and optics that are used for system calibration and exposure, including a CCD camera that links system calibration to alignment. As a result overlay performance is stable, and is shown to be independent of alignment mark image contrast changes due to different mask materials or resist thicknesses. The mask process uses a conventional chemically amplified resist, and does not require the use of charge dissipating top layers. Combined with throughput that is essentially independent of pattern complexity, DUV pattern generation provides a high yield solution for second level patterning of advanced PSMs for the 65nm and 45nm nodes.

Paper Details

Date Published: 16 June 2005
PDF: 12 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637276
Show Author Affiliations
Thomas Ostrom, Micronic Laser Systems AB (Sweden)
Angela Beyerl, Micronic Laser Systems AB (Sweden)
Henrik Sjoberg, Micronic Laser Systems AB (Sweden)
Tom Newman, Micronic Laser Systems AB (Sweden)
Peter Hogfeldt, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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