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Proceedings Paper

Application data of the electron beam based photomask repair tool MeRiT MG
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Paper Abstract

With the ever decreasing feature sizes and increasing cost of current and future photolithographic masks the repair of these masks becomes a substantial factor of the total mask production cost. In collaboration NaWoTec GmbH, Carl Zeiss Nano Technology Systems Division and Carl Zeiss Semiconductor Metrology Systems Division have launched a mask repair tool capable of processing a wide variety of mask types, such as quartz binary masks, phase shift masks, EUV masks, and e-beam projection stencil masks. In this paper, besides a brief overview of the tool platform, we will present the automated repair of clear and opaque defects on Cr and MoSi quartz masks. Emphasis will be put onto the resolution and the speed of the repair procedure and the high grade of automation and integration achievable in the repair of highend photomasks. An outlook against the ITRS requirements and the extendibility of the presented solution to further technology nodes will be given in the summary.

Paper Details

Date Published: 16 June 2005
PDF: 10 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637273
Show Author Affiliations
Christian Ehrlich, Carl Zeiss SMS GmbH (Germany)
Klaus Edinger, NaWoTec GmbH (Germany)
Volker Boegli, NaWoTec GmbH (Germany)
Peter Kuschnerus, Carl Zeiss NTS GmbH (Germany)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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