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Proceedings Paper

Progress in 193nm immersion lithography at IMEC
Author(s): K. Ronse; G. Vandenberghe; E. Hendrickx; L. H. A. Leunissen; Y. Aksenov
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Paper Abstract

In 2004, the successful feasibility study of immersion lithography has completely pushed back the interest in 157nm lithography. Almost the complete industry has redirected its efforts and investment to 193nm immersion lithography. IMEC has announced a new lithography affiliation program on 193nm immersion technology. The program has attracted a lot of attention and a large number of companies have joined the IMEC program in the mean time. In this paper, a status update will be given on the 193nm immersion work at IMEC. Simulation and experimental results are shared and the outlook to the future of immersion lithography will be given. Special emphasis will be put on mask related issues.

Paper Details

Date Published: 16 June 2005
PDF: 7 pages
Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); doi: 10.1117/12.637271
Show Author Affiliations
K. Ronse, IMEC (Belgium)
G. Vandenberghe, IMEC (Belgium)
E. Hendrickx, IMEC (Belgium)
L. H. A. Leunissen, IMEC (Belgium)
Y. Aksenov, Philips Research Leuven (Belgium)


Published in SPIE Proceedings Vol. 5835:
21st European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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