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Proceedings Paper

Effect of controlled vacancy injection by ion implantation on the intermixing of InGa/GaAs quantum wells
Author(s): William P. Gillin; Kevin P. Homewood; Brian J. Sealy
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Paper Abstract

- The diffusion coefficient of interdiffusion in InGaAs/GaAs strained quantum wells has been determined as a function of time following implantation with gallium arsenic and krypton ions. All implants were shown to produce some collisional mixing. Gallium implantation produced no enhancement of the intermixing over unimplanted samples whilst krypton implantation produced a factor oftwo increase in the interdiffusion. Arsenic implantation produced a two step diffusion mechanism with a fast initialdiffusion(20 times unimplanted)and a steady state region similar to that observed with krypton implants. I.

Paper Details

Date Published: 16 December 1992
PDF: 4 pages
Proc. SPIE 1622, Emerging Optoelectronic Technologies, (16 December 1992); doi: 10.1117/12.636952
Show Author Affiliations
William P. Gillin, Univ. of Surrey (United Kingdom)
Kevin P. Homewood, Univ. of Surrey (United Kingdom)
Brian J. Sealy, Univ. of Surrey (United Kingdom)


Published in SPIE Proceedings Vol. 1622:
Emerging Optoelectronic Technologies
Krishna Shenai; Ananth Selvarajan; C. Kumar N. Patel; C. N. R. Rao; B. S. Sonde; Vijai K. Tripathi, Editor(s)

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