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Proceedings Paper

Dense OPC for 65nm and below
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Paper Abstract

In this paper, we evaluate the use of dense pixel-based simulation for OPC corrections at 65nm and below. Dense OPC can be performed in one of two "domains": (1) pixel domain or (2) edge domain. We describe the difference between these two domains and describe techniques which are suitable for those domains. The use of fast contour based OPC verification is critical to determine which OPC techniques perform best.

Paper Details

Date Published: 9 November 2005
PDF: 12 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599259 (9 November 2005); doi: 10.1117/12.633756
Show Author Affiliations
Nicolas B. Cobb, Mentor Graphics Corp. (United States)
Yuri Granik, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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