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Proceedings Paper

UV sub-ps laser pulse patterning of Mo/Si and W/Si multilayers for soft x-ray gratings
Author(s): E. Majkova; S. Luby; Y. Chushkin; M. Jergel; D. Papazoglou; A. Manousaki; C. Fotakis; G. Zergioti; J. Sobota
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Paper Abstract

The micropatteming of multilayer gratings (MLG) using ultraviolet sub-ps laser pulses is described. A micromachining system operating with a 0.5 ps KrF laser (248 nm) was used. Grating structures with a groove width in sub-pm region were created in Mo/Si, Si/Mo, W/Si and Si/W multilayers (MLs) with 5 (in one case 10) periods, each 7-10 nm thick. Grating area was up to 900 x 900 μm2. Laser fluence on the samples varied between 60 and 710 mJcm-2. Atomic force microscopy, scanning electron microscopy, X-ray reflectivity and X-ray diffraction were used to characterize multilayers and gratings. MIs were locally ablated up to the Si, oxidized Si or glass substrate, or deeper, using from 1 to 5 pulses. The roughness on the surface of lines and in grooves of MLG increased with the depth of ablation. It was caused first of all by debris. The ω-scans around the 1st Bragg maximum show symmetric satellites up to the 2nd or 3rd order, giving the evidence that the ML in MLG is preserved.

Paper Details

Date Published: 7 June 2005
PDF: 7 pages
Proc. SPIE 5850, Advanced Laser Technologies 2004, (7 June 2005); doi: 10.1117/12.633704
Show Author Affiliations
E. Majkova, Institute of Physics (Slovak Republic)
S. Luby, Institute of Physics (Slovak Republic)
Y. Chushkin, Institute of Physics (Slovak Republic)
M. Jergel, Institute of Physics (Slovak Republic)
D. Papazoglou, IESL, Foundation for Research and Technology-Hellas (Greece)
A. Manousaki, IESL, Foundation for Research and Technology-Hellas (Greece)
C. Fotakis, IESL, Foundation for Research and Technology-Hellas (Greece)
G. Zergioti, National Technical Univ. of Athens (Greece)
J. Sobota, Institute of Scientific Instruments (Czech Republic)

Published in SPIE Proceedings Vol. 5850:
Advanced Laser Technologies 2004
Ivan A. Shcherbakov; Anna Giardini; Vitali I. Konov; Vladimir I. Pustovoy, Editor(s)

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