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Proceedings Paper

The possibility of CrOx as the top coating material on a MoSi HT
Author(s): Noriyuki Harashima; Hiroyuki Iso; Tatsuya Isozaki; Naohiro Umeo; Takaei Sasaki
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Paper Abstract

A binary Cr is widely used material as the top coating on a MoSi HT. Generally, a binary Cr mask has larger GL(Global loading) than a MoSi HT by dry etching process. Now we are using a binary Cr as the masking material for a MoSi HT. So if we want to make a MoSi HT pattern with smaller CD variation, we have to make a smaller CD variation for Cr pattern. Two layers, that is, a metal Cr film and a CrOx film, make a binary Cr. GL is one of the source of a CD variation on a MoSi HT. In our investigation, a binary Cr GL is caused by a metal Cr GL. In order to make a MoSi HT with smaller CD variation, we examined monolayer CrOx film, which has a shorter dry etching time and a smaller GL property. As the result, we conformed the optimized monolayer CrOx film can be used as a good masking material for MoSi HT production. We improved GL by the monolayer CrOx film and we found it has a proper OD(Optical Density) and a excellent electric conductivity on a MoSi HT.

Paper Details

Date Published: 8 November 2005
PDF: 5 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59923R (8 November 2005); doi: 10.1117/12.633291
Show Author Affiliations
Noriyuki Harashima, ULVAC Coating Corp. (Japan)
Hiroyuki Iso, ULVAC Coating Corp. (Japan)
Tatsuya Isozaki, ULVAC Coating Corp. (Japan)
Naohiro Umeo, ULVAC Coating Corp. (Japan)
Takaei Sasaki, ULVAC Coating Corp. (Japan)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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