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Proceedings Paper

Production performance of a Sigma7300 DUV mask writer
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Paper Abstract

SLM-based DUV laser writers are gaining acceptance for 2nd level PSM and binary mask patterning. These writers can use an e-beam compatible resist enabling tool and process sharing. For binary mask patterning, critical metrics include: critical dimension uniformity (CDU), CD targeting, mask registration, defect performance and inspectability. For PSM applications, pattern fidelity matching to 1st level and PSM overlay are also important. A Sigma7300 is being integrated into 65nm and 45nm production. Binary and PSM mask performance data will be presented. Tool self metrics to characterize SLM health will also be presented. Data conversion, data preparation and production write times will be discussed.

Paper Details

Date Published: 4 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59920V (4 November 2005); doi: 10.1117/12.633167
Show Author Affiliations
Bob Olshausen, Intel Corp. (United States)
Mahesh Chandramouli, Intel Corp. (United States)
Dustin Wall, Intel Corp. (United States)
Bruce Auches, Intel Corp. (United States)
Damon Cole, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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