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Proceedings Paper

Advanced manufacturing rules check (MRC) for fully automated assessment of complex reticle designs
Author(s): R. Gladhill; D. Aguilar; P. D. Buck; D. Dawkins; S. Nolke; J. Riddick; J. A. Straub
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Paper Abstract

Advanced electronic design automation (EDA) tools, with their simulation, modeling, design rule checking, and optical proximity correction capabilities, have facilitated the improvement of first pass wafer yields. While the data produced by these tools may have been processed for optimal wafer manufacturing, it is possible for the same data to be far from ideal for photomask manufacturing, particularly at lithography and inspection stages, resulting in production delays and increased costs. The same EDA tools used to produce the data can be used to detect potential problems for photomask manufacturing in the data. A production implementation of automated photomask manufacturing rule checking (MRC) is presented and discussed for various photomask lithography and inspection lines. This paper will focus on identifying data which may cause production delays at the mask inspection stage. It will be shown how photomask MRC can be used to discover data related problems prior to inspection, separating jobs which are likely to have problems at inspection from those which are not. Photomask MRC can also be used to identify geometries requiring adjustment of inspection parameters for optimal inspection, and to assist with any special handling or change of routing requirements. With this foreknowledge, steps can be taken to avoid production delays that increase manufacturing costs. Finally, the data flow implemented for MRC can be used as a platform for other photomask data preparation tasks.

Paper Details

Date Published: 4 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59920A (4 November 2005); doi: 10.1117/12.632743
Show Author Affiliations
R. Gladhill, Toppan Photomasks, Inc. (United States)
D. Aguilar, Toppan Photomasks, Inc. (United States)
P. D. Buck, Toppan Photomasks, Inc. (United States)
D. Dawkins, Toppan Photomasks, Inc. (United States)
S. Nolke, Toppan Photomasks, Inc. (United States)
J. Riddick, Toppan Photomasks, Inc. (United States)
J. A. Straub, Toppan Photomasks, Inc. (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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