Share Email Print
cover

Proceedings Paper

Characterization and qualification of the Jeol JBX9000-MVII e-beam writer for the 90nm node and its integration in a photomask manufacturing line
Author(s): Luigi Raffaele; Carlo Pogliani; Gian Luca Cassol; Giovanni Bianucci; Shiaki Murai; Shoichi Murata; Ryugo Hikichi; Hidenao Katsuki; Shigeru Noguchi
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The advanced Jeol JBX9000MVII 50kV electron-beam lithography system has been successfully installed at DNP Photomask Europe and timely qualified for the 90nm technology node. The overall performances of this writing tool have thoroughly been assessed on positive and negative tone chemically amplified resists (CARs), fully exploiting the advanced proximity effect correction (PEC) capabilities of the system and carefully optimizing the overall process. The reported results show the machine capabilities in terms of global and local pattern placement and CD accuracy, CD linearity, pattern fidelity, along with data on some of the most demanding model-based OPC validation patterns. Details on process characterization and tuning effectiveness on resist and chrome are shown, including the PEC approach. Based on the stringent metrology correlation achieved with DNP Japan manufacturing site, the data show a one-to-one compatibility with the sister tool installed there, even on the most critical OPC structures. Consequently, the complete product interchangeability between the two manufacturing sites has been achieved.

Paper Details

Date Published: 8 November 2005
PDF: 13 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924W (8 November 2005); doi: 10.1117/12.632399
Show Author Affiliations
Luigi Raffaele, DNP Photomask Europe, Spa (Italy)
Carlo Pogliani, DNP Photomask Europe, Spa (Italy)
Gian Luca Cassol, DNP Photomask Europe, Spa (Italy)
Giovanni Bianucci, DNP Photomask Europe, Spa (Italy)
Shiaki Murai, DNP Photomask Europe, Spa (Italy)
Shoichi Murata, Dai Nippon Printing Co., Ltd. (Japan)
Ryugo Hikichi, Dai Nippon Printing Co., Ltd. (Japan)
Hidenao Katsuki, Dai Nippon Printing Co., Ltd. (Japan)
Shigeru Noguchi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

© SPIE. Terms of Use
Back to Top