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Proceedings Paper

Reticle haze measurement by spectroscopic elipsometry
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Paper Abstract

Haze formation on reticle continues to be a significant problem for the semiconductor industry. Haze can be formed on the outside pellicle and on the quartz back side of the reticle. Major component of the haze is known to be aluminum sulfate that comes from the reticle cleaning process. The reticle materials, the exposure wavelength, roughness of photomask and this haze will affect the resolution and process latitude. So the haze on the mask surface becomes more important. We need to know the usable lifetime of the reticle in terms of haze and need to know how to increase the lifetime by removing the haze, if possible. This paper introduces the haze measurement method by using the spectroscopic ellipsometry. The quantity of the haze including the roughness of the reticle can be accurately measured by the spectroscopic ellipsometry. The spectroscopic data shows the increase of the delta value with the energy dose given to the reticle. We confirm that this signal increase is directly the result of the haze increase with dose.

Paper Details

Date Published: 8 November 2005
PDF: 10 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924L (8 November 2005); doi: 10.1117/12.632375
Show Author Affiliations
Young-Hoon Kim, Hanyang Univ. (South Korea)
Seong-Jin Kim, Hanyang Univ. (South Korea)
Jin-Back Park, Hanyang Univ. (South Korea)
Mi-Lim Jung, Hanyang Univ. (South Korea)
Sung-Hyuck Kim, Samsung Electronics (South Korea)
Seung-Wook Park, Hanyang Univ. (South Korea)
Jai-Sun Kyoung, Hanyang Univ. (South Korea)
Il-Sin An, Hanyang Univ. (South Korea)
Hye-Keun Oh, Hanyang Univ. (South Korea)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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