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Proceedings Paper

Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting
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Paper Abstract

At SPIE Microlithography 2005, the concept of direct imprinting of dielectric material for dual damascene processing and its benefits was introduced 1. Manufacturing a nano-imprint template with multi-tier 3-D structures presents a unique set of challenges. The main issues are patterning two different mask layers with good overlay and etch depth control into the quartz at each step on the same substrate. This work describes the tools and processes used to build these types of structures in a commercial photomask shop. The results of using a template with two levels of patterning to imprint dual damascene 3-D structures will also be presented.

Paper Details

Date Published: 7 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59922F (7 November 2005); doi: 10.1117/12.632312
Show Author Affiliations
Susan MacDonald, Toppan Photomasks, Inc. (United States)
Greg Hughes, Toppan Photomasks, Inc. (United States)
Michael Stewart, The Univ. of Texas at Austin (United States)
Frank Palmieri, The Univ. of Texas at Austin (United States)
C. Grant Willson, The Univ. of Texas at Austin (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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