Share Email Print
cover

Proceedings Paper

Advanced mask cleaning techniques for sub-100-nm technology nodes
Author(s): James S. Papanu; Roman Gouk; Cole Franklin; Han-Wen Chen; Steven Verhaverbeke; Alexander Ko; Kent Child; Pieter Boelen; Suresh Shrauti; Elias Martinez; Brian J. Brown
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Sub-pellicle defects and haze increase due to photon reaction with cleaning chemistry residues are especially problematic on photomasks for 193 nm and shorter exposure wavelengths. In addition to mask cleaning, these chemistries are also used for photoresist stripping from photomasks. In this paper sulfuric acid free processes are shown to be effective for mask cleaning and photoresist removal. Bulk removal of photoresist was accomplished with both oxygen based dry plasma stripping and with wet oxidizing chemistry. Surface preparation prior to the main cleaning step was necessary to render Cr surface hydrophilic and enable targeted cleaning performance. This was accomplished with an O3/DI pre-treatment step. Full mask megasonics improved particle removal efficiency of moderately to heavily contaminated masks.

Paper Details

Date Published: 5 November 2005
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921G (5 November 2005); doi: 10.1117/12.632294
Show Author Affiliations
James S. Papanu, Applied Materials, Inc. (United States)
Roman Gouk, Applied Materials, Inc. (United States)
Cole Franklin, Applied Materials, Inc. (United States)
Han-Wen Chen, Applied Materials, Inc. (United States)
Steven Verhaverbeke, Applied Materials, Inc. (United States)
Alexander Ko, Applied Materials, Inc. (United States)
Kent Child, Applied Materials, Inc. (United States)
Pieter Boelen, Applied Materials, Inc. (United States)
Suresh Shrauti, Applied Materials, Inc. (United States)
Elias Martinez, Applied Materials, Inc. (United States)
Brian J. Brown, Applied Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

© SPIE. Terms of Use
Back to Top