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Proceedings Paper

Mobile metrology for advanced photomask manufacturing
Author(s): Paul MacDonald; Michael P. Goudy; Devi Koty; Henryson Omoregie; M. David Webster
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Paper Abstract

Accuracy and fabrication cost of optical masks continue to be major concerns for the semiconductor industry. While immersion and other process technologies promise to extend optical lithography down to the 45nm node, the resulting technical and commercial requirements for the mask fabrication process become increasingly difficult to achieve. Potential solutions that are readily available to wafer fabricators are either too expensive to deploy or have not been commercialized for mask manufactures- up until now. Mobile metrology has the inherent ability to provide the required measurement accuracy, on any tool, at a low cost of ownership. This paper will discuss the application of a self-contained, wireless SensorPlate for providing process optimization and control within a leading mask blank manufacturing facility. Three critical process steps are characterized: Quartz Cleaning, Chromium Physical Vapor Deposition, and Photoresist Post-Applied Baking. Process optimization was completed to achieve improved performance of the mask blank product.

Paper Details

Date Published: 5 November 2005
PDF: 10 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921J (5 November 2005); doi: 10.1117/12.632221
Show Author Affiliations
Paul MacDonald, OnWafer Technologies (United States)
Michael P. Goudy, SCHOTT Lithotec (United States)
Devi Koty, SCHOTT Lithotec (United States)
Henryson Omoregie, SCHOTT Lithotec (United States)
M. David Webster, SCHOTT Lithotec (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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