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Proceedings Paper

Calibration of compact OPC models using SEM contours
Author(s): Yuri Granik
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Paper Abstract

We present Optical Proximity Correction (OPC) model calibration flow which extracts printing shapes from the Scanning Electron Microscope (SEM) pictures, combines this information with CD measurements, and uses it to build OPC models. Such massive calibration comprehensively covers one- and two-dimensional printing effects, and ensures accurate corrections under widely varying proximity conditions.

Paper Details

Date Published: 5 November 2005
PDF: 7 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921V (5 November 2005); doi: 10.1117/12.632218
Show Author Affiliations
Yuri Granik, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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