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Proceedings Paper

Hybrid ORC method for low K1 process
Author(s): Byungho Nam; Jaeseung Choi; Yeongbae Ahn; Cheolkyun Kim; Hyoungsoon Yune; James Moon; Donggyu Yim; Jinwoong Kim
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Paper Abstract

In recent years, more burden is placed on OPC(Optical Proximity effect Correction) and ORC(Optical Rule Check) like never before due to low process margin caused by adoption of "Low K1" technology on lithography process. Normally, chip is composed of cell, core and periphery regions. Each of these regions has different characteristics patterning wise but usually the region with high density has much more chance for pinch, bridge or killing error and also has small process window. So verification of OPCed data must be highly accurate with fast operation speed. In this paper we developed full chip based ORC(Optical Rule Check)which satisfies both need, accuracy and speed. The result of pinch, bridge and small process window verification of Hybrid ORC will be shown followed by comparison of rule and model ORC methods.

Paper Details

Date Published: 7 November 2005
PDF: 9 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59922T (7 November 2005); doi: 10.1117/12.632023
Show Author Affiliations
Byungho Nam, Hynix Semiconductor Inc. (South Korea)
Jaeseung Choi, Hynix Semiconductor Inc. (South Korea)
Yeongbae Ahn, Hynix Semiconductor Inc. (South Korea)
Cheolkyun Kim, Hynix Semiconductor Inc. (South Korea)
Hyoungsoon Yune, Hynix Semiconductor Inc. (South Korea)
James Moon, Hynix Semiconductor Inc. (South Korea)
Donggyu Yim, Hynix Semiconductor Inc. (South Korea)
Jinwoong Kim, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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