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Proceedings Paper

Nanoimprint lithography: review of aspects and applications
Author(s): D. J. Wagner; A. H. Jayatissa
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Paper Abstract

Nanoimprint lithography is a relatively new area of study in nanotechnology. Higher resolution patterning can be achieved with nanoimprint lithography than with light diffraction or beam scattering in photoresists. Nanoimprint lithography is a generic term for nano-scale pattern transfer using embossing techniques. These techniques introduce new problems such as: nano-scale alignment, nanovoids and adhesion to the mold. The pattern is typically created in a mold using e-beam writing in photoresist on a substrate and dry etching to transfer the pattern to the mold. A low wattage dry etching process is preferred as to create as smooth a surface as possible to reduce the likelihood of polymers adhering to the mold surface. These molds are generally very durable and can be used repeatedly. Once the mold is created, an anti-sticking coating is often applied to prevent photoresist adhesion. There have been a variety of parameters used to emboss the patterns in photoresists using elevated temperature, room temperature, single and multiple layers of photoresists to name a few. This article reviews some of the current methods of creating nano-scale geometries and will include some areas of application. It will also discuss examples of achieved resolutions and the difficulties in producing them.

Paper Details

Date Published: 23 November 2005
PDF: 9 pages
Proc. SPIE 6002, Nanofabrication: Technologies, Devices, and Applications II, 60020R (23 November 2005); doi: 10.1117/12.631046
Show Author Affiliations
D. J. Wagner, Univ. of Toledo (United States)
A. H. Jayatissa, Univ. of Toledo (United States)


Published in SPIE Proceedings Vol. 6002:
Nanofabrication: Technologies, Devices, and Applications II
Warren Y.-C. Lai; Leonidas E. Ocola; Stanley Pau, Editor(s)

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