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Proceedings Paper

Multiscale structures for polarization control by using imprint and UV lithography
Author(s): Xuegong Deng; Jian Wang; Feng Liu; Paul F. Sciortino; Xiaoming Liu; Alan Graham
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Paper Abstract

We investigate a viable manufacture method of large area transmission only polarizers (TOPOL). A multilayer, mixed-scale (nanostructures and microstructrures) design is presented to accomplish the required functional integration. The effective domain of the device is less than 2 μm in thickness. Nanoimprint and UV lithography is combined to demonstrate the viable fabrication processes with 100 mm diameter wafers. The proposed structures can be further integrated. We also present detailed comparisons of the integrated devices with high-performance commercial-grade bulk optics.

Paper Details

Date Published: 16 November 2005
PDF: 12 pages
Proc. SPIE 6003, Nanostructure Integration Techniques for Manufacturable Devices, Circuits, and Systems: Interfaces, Interconnects, and Nanosystems, 60030X (16 November 2005); doi: 10.1117/12.630578
Show Author Affiliations
Xuegong Deng, NanoOpto Corp. (United States)
Jian Wang, NanoOpto Corp. (United States)
Feng Liu, NanoOpto Corp. (United States)
Paul F. Sciortino, NanoOpto Corp. (United States)
Xiaoming Liu, NanoOpto Corp. (United States)
Alan Graham, NanoOpto Corp. (United States)


Published in SPIE Proceedings Vol. 6003:
Nanostructure Integration Techniques for Manufacturable Devices, Circuits, and Systems: Interfaces, Interconnects, and Nanosystems
Minoru M. Freund; M. Saif Islam; Achyut K. Dutta, Editor(s)

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