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Proceedings Paper

Template manufacturing for nanoimprint lithography using existing infrastructure
Author(s): Mathias Irmscher; Joerg Butschke; Guenter Hess; Florian Letzkus; Markus Renno; Holger Sailer; Hubert Schulz; Anatol Schwersenz; Ecron Thompson; Boris Vratzov
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Paper Abstract

An initial Nanoimprint template manufacturing process using a state-of-the-art mask front end line has been developed. The process flow is based on conventional 6025 photomask blanks and known basic process steps for chrome and quartz etching. While these etching processes have been slightly adapted, a comprehensive investigation of chemically amplified resists for this purpose was done. We were able to identify a pre-commercial pCAR enabling to approach the 50nm dense line resolution using the Leica SB350 variable shaped beam e-beam writer. We characterized profile, CD-linearity, CD-uniformity and placement accuracy of the nanoimprint templates. The final imprinting of different pattern proved the applicability of the manufactured stamps for the nanoimprint technology.

Paper Details

Date Published: 8 November 2005
PDF: 12 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59922E (8 November 2005); doi: 10.1117/12.629974
Show Author Affiliations
Mathias Irmscher, IMS Chips (Germany)
Joerg Butschke, IMS Chips (Germany)
Guenter Hess, Schott Lithotec AG (Germany)
Florian Letzkus, IMS Chips (Germany)
Markus Renno, Schott Lithotec AG (Germany)
Holger Sailer, IMS Chips (Germany)
Hubert Schulz, Carl Zeiss NTS GmbH (Germany)
Anatol Schwersenz, IMS Chips (Germany)
Ecron Thompson, Molecular Imprints, Inc. (United States)
Boris Vratzov, Molecular Imprints GmbH (Germany)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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