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Proceedings Paper

Nanoprocessing of semiconductors and metals with nJ femtosecond laser pulses
Author(s): R. Le Harzic; D. Sauer; I. Riemann; K. König
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Paper Abstract

We report on sub-μm structuring of semiconductors, dielectrics, polymers and metals using a laser scanning microscope. A commercial Ti:Sapphire oscillator laser (20 nJ/pulse; 90 MHz; 150 fs) was coupled into a laser scanning microscope FemtOcut (JenLab GmbH). High numerical aperture objectives were applied to obtain fluences in the range of a few J/cm2 which are well above the ablation threshold. Such a cost-effective and reliable system compared to amplified lasers systems (μJ or mJ/pulse) is adapted for material manufacturing and can be of prime interest for specific applications in security like counterfeiting.

Paper Details

Date Published: 4 November 2005
PDF: 10 pages
Proc. SPIE 5989, Technologies for Optical Countermeasures II; Femtosecond Phenomena II; and Passive Millimetre-Wave and Terahertz Imaging II, 59890O (4 November 2005); doi: 10.1117/12.629659
Show Author Affiliations
R. Le Harzic, Fraunhofer Institute of Biomedical Technology (Germany)
JenLab GmbH (Germany)
D. Sauer, Fraunhofer Institute of Biomedical Technology (Germany)
I. Riemann, Fraunhofer Institute of Biomedical Technology (Germany)
K. König, Fraunhofer Institute of Biomedical Technology (Germany)


Published in SPIE Proceedings Vol. 5989:
Technologies for Optical Countermeasures II; Femtosecond Phenomena II; and Passive Millimetre-Wave and Terahertz Imaging II
Sean M. Kirkpatrick; Razvan Stoian; David H. Titterton; Roger Appleby; J. Martyn Chamberlain; Keith A. Krapels, Editor(s)

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