Share Email Print
cover

Proceedings Paper

Applying assist features to improve two dimensional feature process robustness
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Sub-resolution assist features are an important tool for improving process robustness for one-dimensional pattern features at advanced manufacturing process nodes. However, sub-resolution assist feature development efforts have not generally considered optimization for process robustness with two-dimensional pattern features. This generally arises both from conservatively placing SRAFs to avoid the possibility of imaging, and from a desire to simplify SRAF placement rules. By studying two-dimensional features using a manufacturing sensitivity model, one can gain insight into the capabilities of SRAFs regarding two-dimensional pattern features. These insights suggest new methodologies for shaping assist features to enhance two-dimensional feature robustness. In addition, a manufacturing sensitivity model form can be employed to optimize the placement of multiple competing SRAFs in localized two-dimensional regions. Initial studies demonstrate significant pullback reduction for two-dimensional features once SRAF placement has been optimized using the manufacturing sensitivity model form.

Paper Details

Date Published: 5 November 2005
PDF: 7 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921N (5 November 2005); doi: 10.1117/12.629395
Show Author Affiliations
Lawrence S. Melvin III, Synopsys, Inc. (United States)
Benjamin D. Painter, Synopsys, Inc. (United States)
Levi D. Barnes, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

© SPIE. Terms of Use
Back to Top