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Proceedings Paper

Integrated post tape outflow for fast design to mask turn-around time
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Paper Abstract

SMIC is a pure-play IC foundry, as foundry culture Turn-Around Time is the most important thing FABs concern about. And aggressive tape out schedule required significant reduction of GDS to mask flow run time. So the objective of this work is to evaluate an OPC methodology and integrated mask data preparation flow on runtime performance via so-called 1-IO-tape-out platform. By the way, to achieve fully automated OPC/MDP flow for production. To evaluate, we choose BEOL layers since they were the ones hit most by runtime performance -- not like FEOL, for example, Poly to CT layers there're still some non-critical layers in the between, OPC mask makings & wafer schedules are not so tight. BEOL, like M2, V2,then M3 V3 and so on, critical layer OPC mask comes one by one continuously. Hence, that's why we pick BEOL layers. And the integrated flow we evaluated included 4 layers of metal with MB-OPC and 6 layers of Via with R-B OPC. Our definition of success to this work is to improve runtime performance at least of larger than 2x. At meantime, of course, we can not sacrifice the model accuracy, so maintaining equal or better model accuracy and OPC/mask-data output quality is also a must. For MDP, we also test the advantage of OASIS and compared with GDS format.

Paper Details

Date Published: 9 November 2005
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599251 (9 November 2005); doi: 10.1117/12.629042
Show Author Affiliations
Chi-Yuan Hung, Semiconductor Manufacturing International Corp. (China)
Qingwei Liu, Semiconductor Manufacturing International Corp. (China)
Liguo Zhang, Mentor Graphics Corp. (China)
Shumay Shang, Mentor Graphics Corp. (United States)
George E. Bailey, Mentor Graphics Corp. (United States)
Andrew Jost, Mentor Graphics Corp. (United States)
Travis Brist, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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