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Proceedings Paper

Genetic algorithm design of reflection thin-film coatings and polarization devices
Author(s): A. R. M. Zaghloul; Y. A. Zaghloul
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Paper Abstract

In this communication, the design of reflection thin-film coatings and polarization-devices is achieved by the use of a recently developed fast genetic algorithm (GA). The reflection thin-film coatings, and polarization-devices, are both treated as film-substrate systems. With the required polarization-characteristics of the device as an input, the GA provides any, or all, of the design parameters at which the coating, or device, behaves as prescribed at the wavelength of operation; film and substrate materials, film thickness, and angle of incidence. The GA is real fast. It is modified to provide the required design parameters within a few cycles, literally in no time. The accuracy of the GA is high, and the GA itself is robust and consistent.

Paper Details

Date Published: 5 October 2005
PDF: 11 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59632E (5 October 2005); doi: 10.1117/12.627432
Show Author Affiliations
A. R. M. Zaghloul, Georgia Institute of Technology (United States)
ITR Technologies Inc. (United States)
Y. A. Zaghloul, Georgia Institute of Technology (United States)
ITR Technologies Inc. (United States)


Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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