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Proceedings Paper

Nano-positioning control of 5-DOF manipulator for alignment of condenser in soft x-ray microscopy system
Author(s): Kyu Gyeom Kim; Jae Hee Kim; Jong Hwan Min; Kyong Woo Kim; Young Man Kwon; Jin Young Min; Kwon Ha Yoon
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Paper Abstract

This paper presents a method of a nano-positioning control for the high precision focusing of a doubled ellipsoidal condenser reflective mirror using 5-axis manipulator. We have developed the compact vertical type of soft X-ray microscopy system with 50nm resolution for biomedical application. This microscopy system is composed of a laser plasma x-ray source, doubled ellipsoidal condenser reflective optics, diffractive zone plate optics and MCP coupled with CCD to record an x-ray image. The X-ray source was focused on a sample by a doubled ellipsoidal condenser reflective mirror. X-ray source focusing will increase the photon density in the object plane and is very important to approach high resolution imaging. Required degree of freedom (DOF) of optics aligner in X-ray microscope is dependent on the kind of optics, but generally 5-DOF is needed. We used 5-axis manipulator that consists of three linear motions (X, Y and Z) and two tilting motions (θx, θy). A linear translation stage is adopted a kind of DC motor with a linear resolution 50nm and travel range of 5mm. The mechanism was controlled with PID controller augmented with closed feedback loop for precision control. A two axis tilt stage is employed a design resolution of 0.23μrad and tilt range of ±7deg. We have designed 5-axis manipulator for the precision position control of condenser mirror optics and have developed to control algorithm by inverse kinematics. The performance of the proposed 5-DOF manipulator is evaluated by using a laser interferometer system with two plane mirror reflectors. The experimental results are depicted in this paper.

Paper Details

Date Published: 10 September 2005
PDF: 4 pages
Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59181A (10 September 2005); doi: 10.1117/12.626316
Show Author Affiliations
Kyu Gyeom Kim, Wonkwang Univ. (South Korea)
Jae Hee Kim, Wonkwang Univ. (South Korea)
Jong Hwan Min, Wonkwang Univ. (South Korea)
Kyong Woo Kim, Wonkwang Univ. (South Korea)
Young Man Kwon, Wonkwang Univ. (South Korea)
Jin Young Min, LISTEM Co. (South Korea)
Kwon Ha Yoon, Wonkwang Univ. (South Korea)


Published in SPIE Proceedings Vol. 5918:
Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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