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Proceedings Paper

Survey of SO4 outgas on mask storage environment
Author(s): Jun Sik Lee; Sung Bae Jee; Sung Min Hwang; Hyun Yul Park; Oscar Han
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Paper Abstract

To countermeasure the haze problem on a reticle, we investigated the mask storage environment of wafer manufacturing Fab and mask manufacturing Fab. Through IC (Ion chromatography) and AIM system, we measured the outgas quantities of Fab environment, SMIF pod, mask carrier boxes and pellicle. With the evaluation result, the environmental factors around the production mask do not meet the level of its residual SO4 ion. We suggested the imminent priority to improve the environment surrounding the production masks. Additionally, we adopted a new process to decrease the SO4 outgas of pellicle frame up to 90%.

Paper Details

Date Published: 8 November 2005
PDF: 8 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599248 (8 November 2005); doi: 10.1117/12.626243
Show Author Affiliations
Jun Sik Lee, Hynix Semiconductor Inc. (South Korea)
Sung Bae Jee, Hynix Semiconductor Inc. (South Korea)
Sung Min Hwang, Hynix Semiconductor Inc. (South Korea)
Hyun Yul Park, Hynix Semiconductor Inc. (South Korea)
Oscar Han, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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