Share Email Print
cover

Proceedings Paper

Deposition of broadband antireflection coatings on plastic substrates by evaporation and reactive pulse magnetron sputtering
Author(s): J. Weber; U. Schulz; N. Kaiser; H. Bartzsch; P. Frach
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Evaporation and reactive pulse magnetron sputtering are two methods to deposit broadband antireflection coatings at low temperatures. The performance of broadband antireflective coatings on polycarbonate (PC) deposited by these methods is shown. Plasma-treatment of the plastic substrates has an important effect on the adhesion of the coating system on the substrate. For sputtering different parameter sets for the pre-treatment as well as the deposition pressure and their effect on adhesion were examined for polycarbonate substrates. Furthermore evaporation and reactive pulse magnetron sputtering were compared with regard to the adhesion of broadband antireflective coatings on PC.

Paper Details

Date Published: 5 October 2005
PDF: 7 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 596327 (5 October 2005); doi: 10.1117/12.625361
Show Author Affiliations
J. Weber, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)
U. Schulz, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
N. Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
H. Bartzsch, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)
P. Frach, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)


Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

© SPIE. Terms of Use
Back to Top