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Proceedings Paper

Ellipsometry of scattering patterns from optical inhomogeneities
Author(s): Carole Deumié; Gaelle Georges; Olivier Gilbert; Claude Amra
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Paper Abstract

The validity of the Ellipsometry of Angular Resolved Scattering technique introduced in a well known scatterometer has been demonstrated. The results were applied to the separation of surface and bulk effects in low-loss samples, because first-order scattering only depends on the origin of scattering, not on the topography or microstructure. The major point that we address is then the generalization of the separation technique (surface or bulk) to arbitrary heterogeneous samples with high level diffuse reflectance. The problem is strongly different since phase data from these samples depend on microstructure, not only on the physical origin of scattering.

Paper Details

Date Published: 20 October 2005
PDF: 7 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651C (20 October 2005); doi: 10.1117/12.625201
Show Author Affiliations
Carole Deumié, Institut Fresnel (France)
Gaelle Georges, Institut Fresnel (France)
Olivier Gilbert, Institut Fresnel (France)
Claude Amra, Institut Fresnel (France)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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