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Proceedings Paper

Catadioptric projection lenses for immersion lithography
Author(s): Heiko Feldmann; Aurelian Dodoc; Alexander Epple; Hans-Jürgen Rostalski; David Shafer; Wilhelm Ulrich
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Paper Abstract

Recently, the development of high NA lenses for immersion lithography turned from dioptric concepts to catadioptric design forms. The introduction of mirrors involves the new challenge to deal with the inevitable obscuration of either field or pupil. We review the strategies used in this regard for microlithography, while focussing on the two most favored ones, folded and inline concepts. Although the vignetting situation is more complicated for inline systems, we report progress in this field of optical design yielding similar system performance for inline and folded designs. Since inline optical systems are much easier to realize, these are the concept of choice.

Paper Details

Date Published: 14 October 2005
PDF: 8 pages
Proc. SPIE 5962, Optical Design and Engineering II, 59620Y (14 October 2005); doi: 10.1117/12.625199
Show Author Affiliations
Heiko Feldmann, Carl Zeiss SMT AG (Germany)
Aurelian Dodoc, Carl Zeiss SMT AG (Germany)
Alexander Epple, Carl Zeiss SMT AG (Germany)
Hans-Jürgen Rostalski, Carl Zeiss SMT AG (Germany)
David Shafer, David Shafer Optical Design (United States)
Wilhelm Ulrich, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 5962:
Optical Design and Engineering II
Laurent Mazuray; Rolf Wartmann, Editor(s)

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