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Proceedings Paper

Reflective high-NA projection lenses
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Paper Abstract

Dioptric systems are usually the first choice for the design of an optical system, e.g. a projection lens or a microscope. But in some cases refractive designs suffer from serious drawbacks like chromatic aberration or material problems (cost, quality, absorption, birefringence, etc.). In such cases reflective systems are an attractive alternative. Reflective systems can be subdivided into two classes: on one hand there are systems with central pupil obscuration, e.g. reflective microscopes or telescopes in astronomy, which have a high aperture but only a small field size, on the other hand there are unobscured systems, e.g. reflective relay systems or EUV projection lenses, which have a large field but only small aperture. By the combination of an unobscured and an obscured mirror system one obtains systems with large field and high numerical aperture. We present new designs, which prove this design principle.

Paper Details

Date Published: 15 October 2005
PDF: 8 pages
Proc. SPIE 5962, Optical Design and Engineering II, 596214 (15 October 2005); doi: 10.1117/12.625196
Show Author Affiliations
Hans-Jürgen Mann, Carl Zeiss SMT AG (Germany)
Wilhelm Ulrich, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5962:
Optical Design and Engineering II
Laurent Mazuray; Rolf Wartmann, Editor(s)

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