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Proceedings Paper

Development of a nanoscale linewidth-standard for high-resolution optical microscopy
Author(s): Uwe Huebner; W. Morgenroth; R. Boucher; W. Mirandé; E. Buhr; Th. Fries; Nadine Schwarz; G. Kunath-Fandrei; R. Hild
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Paper Abstract

We are developing a new linewidth standard on the nanometre scale for use in the recently introduced new high-resolution optical microscopy techniques like deep ultraviolet microscopy (UVM) and confocal laser scanning microscopy (CLSM). Different types of high-resolution gratings, etched in amorphous silicon on quartz substrates, have been fabricated and evaluated using state-of-the-art UVM, CLSM, REM and AFM equipment. The produced linewidths range from about 80 nm to 2 μm. The contrast of the pattern in the UV region makes them suitable for transmission and reflection UV and laser scanning microscopy.

Paper Details

Date Published: 20 October 2005
PDF: 9 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651W (20 October 2005); doi: 10.1117/12.625194
Show Author Affiliations
Uwe Huebner, Institute for Physical High Technology Jena (Germany)
W. Morgenroth, Institute for Physical High Technology Jena (Germany)
R. Boucher, Institute for Physical High Technology Jena (Germany)
W. Mirandé, Physikalisch-Technische Bundesanstalt (Germany)
E. Buhr, Physikalisch-Technische Bundesanstalt (Germany)
Th. Fries, FRT GmbH (Germany)
Nadine Schwarz, FRT GmbH (Germany)
G. Kunath-Fandrei, Carl Zeiss Jena GmbH (Germany)
R. Hild, HTWK Leipzig (Germany)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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