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Proceedings Paper

Spectral characterization of scattering losses in r. f. sputtered oxide coatings
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Paper Abstract

Multilayer optical devices generally suffer from two main losses sources: absorption of the materials and scattering losses, due both to volume and surface effects. The exact estimation of this latter contribution is of extreme importance for the final assessment and optimization of efficient devices. In particular, when intrinsic absorption of the materials cannot be further reduced, scattering measurements may provide useful information for improving optical device performance. In this work we investigated single SiO2, Al2O3 and HfO2 layers deposited by r.f. sputtering under different deposition conditions. These materials are being studied for implementation in multilayer dichroic mirrors for laser applications in the range from 260 to 350 nm. To avoid radiation damage, such devices need to be loss-free in the pumping and lasing region; hence, an insightful knowledge of all losses sources is fundamental.

Paper Details

Date Published: 20 October 2005
PDF: 7 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651U (20 October 2005); doi: 10.1117/12.625159
Show Author Affiliations
M. L. Grilli, ENEA (Italy)
A. Krasilnikova, ENEA (Italy)
F. Menchini, ENEA (Italy)
A. Piegari, ENEA (Italy)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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